[labnetwork] STS DRIE mass flow controller programming

Paolini, Steven spaolini at cns.fas.harvard.edu
Mon Oct 19 17:04:34 EDT 2020


Patrick,
  If you can’t access and modify the configuration files, you will need the vendor to assist you.
  Best of luck,

Steve Paolini
Principal Equipment Engineer
Harvard University Center for Nanoscale Systems
11 Oxford St.
Cambridge, MA 02138
617- 496- 9816
spaolini at cns.fas.harvard.edu
www.cns.fas.harvard.edu

From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Patrick Roman
Sent: Monday, October 19, 2020 2:21 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] STS DRIE mass flow controller programming

Greetings,

I have an original STS ASE DRIE system that needs to have the SF6 input increased to optimize silicon etching performance.  My SF6 MFC is limited to 50 sccm in the software settings and I would like to increase that limit to 150 sccm.  The hardware has 500 sccm capability.  Does anyone have this experience/know how?  Thanks in advance!!!

Regards,

Patrick Roman, PhD
Associate Professor of Research

Mechanical and Materials Engineering

Assistant Director, AMERI<https://urldefense.proofpoint.com/v2/url?u=http-3A__ameri.fiu.edu_&d=DwMFaQ&c=WO-RGvefibhHBZq3fL85hQ&r=-H4Z_jeDfTYjnKPXor15vLwzBllmg8gFrb9m_k9OGks&m=kl-ROS_wuXVE3wGJPZKNxwo0kfAuIr8LS9ykvHQrSco&s=2-th-Nvz6RSbG1jBoEtYyWCzOXLeGZSPIp2wxOXVRnc&e=>

R&D Engineer, GFJC<https://urldefense.proofpoint.com/v2/url?u=https-3A__gfjc.fiu.edu_&d=DwMFaQ&c=WO-RGvefibhHBZq3fL85hQ&r=-H4Z_jeDfTYjnKPXor15vLwzBllmg8gFrb9m_k9OGks&m=kl-ROS_wuXVE3wGJPZKNxwo0kfAuIr8LS9ykvHQrSco&s=QgMwpzCCGholmvH1NTR30mxiGDnaNBWPrETwJF0epzU&e=>, NFSTC<https://urldefense.proofpoint.com/v2/url?u=https-3A__www.nfstc.org_&d=DwMFaQ&c=WO-RGvefibhHBZq3fL85hQ&r=-H4Z_jeDfTYjnKPXor15vLwzBllmg8gFrb9m_k9OGks&m=kl-ROS_wuXVE3wGJPZKNxwo0kfAuIr8LS9ykvHQrSco&s=Sd7EJFAvpB5ZcsLWsa477TW5ReTBKwc82g4D9_ffXE8&e=>

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