[labnetwork] Recommendation for small footprint LPCVD system?

[jsmith at tystar.com]

Hi Mario,

 

Please have a look at www.tystar.com <http://www.tystar.com>  . We have a few different methods of depositing SiO2 and Si3N4 on 200mm wafers, LPCVD and Photo Enhanced CVD. If you have any questions please let me know. Thanks

 

Best Regards,

 

Jim Smith

Business Development Mgr.

Tystar Corporation

7050 Lampson Ave.

Garden Grove, Calif. 92841

* Office: 310-781-9219 ext 216  

* Cell: 310-618-4018

* Fax: 310-781-9438

*  <mailto:jsmith at tystar.com> jsmith at tystar.com

 <http://www.tystar.com/> http://www.tystar.com

 

 

This Document is confidential and it is intended only for the addressee(s). Any review, dissemination, distribution, or copying of this message by persons or entities other than the intended recipient is strictly prohibited. 

 

 

 

From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Beaudoin, Mario
Sent: Monday, February 22, 2021 3:46 PM
To: labnetwork at mtl.mit.edu
Cc: Gou, Steven <steven.gou at ubc.ca>
Subject: [labnetwork] Recommendation for small footprint LPCVD system?

 

Dear Labnetwork experts,

We're looking to purchase an LPCVD system to deposit SiN and SiO2 for silicon photonics.  We have low volumes but occasionally need to deposit on 200mm wafers.  Ideally, we would prefer a vertical system that only needs to accommodate one 200 mm wafer on occasion while most of the work will be on multiple smaller samples (eg 25x25mm).

Any suggestions or recommendations are welcomed.

Mario

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