[labnetwork] ICP STS ASE Issue

[Rosendo Bindoy]

Hello Jerry,

Since you replaced a bad capacitor you may need to retune the load and tune position first to be sure that it is matching well. Plasma may not be stable and the cooling rate on the surface of the wafer is higher that the heat rate created during etching. You can try setting a higher chiller temp and see if the grass formation is lessen or eliminated.

Regards

Rosendo

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________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Shepard, Jeremiah J <jshepar at purdue.edu>
Sent: Wednesday, July 21, 2021 6:54 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ICP STS ASE Issue

I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue.

Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...?

Thanks,
Jerry Shepard

[cid:b5ebd4e6-f9a5-41ac-91e8-fb784f88dacc]
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