[labnetwork] Gas Purity Grade for RIE

[Lewis,William]

Hi Loïk,

Four nines is definitely clean enough for plasma etch processes.....and, I seriously doubt 3 nines would be an issue for most processes.  The cost jumps quite a bit from 4 nines to 5 nines.  Filtration and purification matters much more for PVD, PECVD etc...

-----Original Message-----
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Dr. Loïk Gence
Sent: Thursday, May 13, 2021 4:16 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Gas Purity Grade for RIE

[External Email]

Hi All,

I hope you are all fine and safe.

We are planning the installation of our first RIE with chlorine and Fluorine chemistries.

I was wondering, what are purity grade of the gases you are using.
Always electronic grade, 5.0 grade or above ?  To avoid potential contamination of the gas lines, chamber, etc...  of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes?

Thanks in advance for your comment.


Best,

Loïk



--

Dr. Loïk Gence
Assistant Professor
Instituto de Física
Pontificia Universidad Católica de Chile Avda. Vicuña Mackenna 4860, CP 7820436 Santiago
Lab: +56 95504 9648


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