[labnetwork] [EXTERNAL] Treating silane exhaust from PECVD

Sat Jan 14 18:43:05 EST 2023

Hadi -

If you only need to abate the SiH4, then you might consider using an Edwards Pyrophoric Conditioning system.  Section 1.3 in the attached talks about application specifics, where it will work and where it won't.  It's still listed on the Edwards website, so I think it's still being manufactured.

https://shop.edwardsvacuum.com/products/pyrophoric%20conditioning%20system%20(pcs)/view.aspx#:~:text=The%20Pyrophoric%20Conditioning%20System%20(PCS,the%20simple%20%22burn%20box%22.

Most folks who use TPUs on PECVD are less concerned with the SiH4 and more concerned with the clean gases as opposed to the deposition gases, especially those classified as greenhouse gases.  Abating the SiH4 is just an added bonus.

We recently sold our only PCS, but there may be others available from equipment brokers, etc. if you have interest.  I know of a gov't contractor who has or had a few, but they had a tough time excessing any unused equipment for resale. They might be willing to donate to a University though, but perhaps it would need to be a US university.  I'm sure this community knows more about that than I do.

Hope this is helpful.  I think the PCS is kind of like the middle ground between letting it go out the stack and using a more traditional abatement system.

Rob Breisch
Vice President, Sales and Marketing
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     Trillium US, Inc.
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From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Aebersold, Julia Weyer
Sent: Friday, January 13, 2023 8:41 AM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD

At the University of Louisville we exhaust our PECVD in the same manner as Draper.  We have a lot of exhaust flow, too.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Morrison, Richard H., Jr
Sent: Thursday, January 12, 2023 4:29 PM
To: hadi_esmaeilsabzali at sfu.ca<mailto:hadi_esmaeilsabzali at sfu.ca>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD

CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue.

We have a trap on our LPCVD furnace to collect the excess material.

Rick

Richard Morrison
DMTS
Draper Laboratory
555 Technology Square
Cambridge Ma  02139
Office: 617-258-3420
Cell: 508-930-3461

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Hadi Esmaeilsabzali
Sent: Thursday, January 12, 2023 2:35 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD

CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.

Dear Colleagues,

For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems.

We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia).

Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time.

I appreciate it if you share other (cost-effective) suggestions you might have for us!

Thanks,
Hadi

Hadi Esmaeilsabzali, PhD

Nanofabrication Group Manager, 4D LABS

Simon Fraser University

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