[labnetwork] Diamond Etching

Thu Aug 1 02:39:43 EDT 2024

Hi Emma,

We did not etch diamond but rather diamond-like carbon films. As Joseph mentioned, we also used O2 plasma in an ICP RIE system. We had HSQ as a mask material.

Best,

Bernhard
________________________________
Von: labnetwork <labnetwork-bounces at mtl.mit.edu> im Auftrag von Joseph Losby <joseph.losby at ucalgary.ca>
Gesendet: Mittwoch, 31. Juli 2024 22:32:09
An: Emma Anquillare; Labnetwork (labnetwork at mtl.mit.edu)
Betreff: Re: [labnetwork] Diamond Etching

Hi Emma,

Our diamond etches are generally done using O2 plasma in an ICP-RIE system at ~250C.  O2/SF6 is used for chamber cleaning, and we usually do it for a longer period of time (30-60 mins).  More information can be found in the following articles:

https://pubs.acs.org/doi/10.1021/acs.nanolett.5b01346

https://pubs.aip.org/aip/app/article/4/1/016101/123128/Realizing-Q-gt-300-000-in-diamond-microdisks-for
[https://aipp.silverchair-cdn.com/aipp/content_public/journal/app/4/1/10.1063_1.5053122/5/016101_1_highlight_f1.jpeg?Expires=1725481620&Signature=fYLoQDRACgZacQYZjhIm1pyDNhUdPbIwLqJCebKspkHxtJRD1efFxDkbxiziNQv6pCJVGtc3yK1pwVtAsmo7OxMOLxxX1iE8Tn6h2a1CVhjv5Q~A~~bAJPazLAmeBaG13FLTYlZ1ruv7MmIG4Nfx2IcLNyfwRTrkta~n1gVuJX555ktkkgmiDGK5svhCrbHpiyt01gDnW0~KpsLnfRwttIeCM5oR-SkxPU-OLF28efuphAkVOkxOxUu2egJ83UskCLIQX~h0kjFTQ57Q8k59dnQiFMBT2UIDqbebkUx4tLTGoZCYQPSH0LSfJFS9uDJeVdpy7MDy7~~a~0hk7KyT~Q__&Key-Pair-Id=APKAIE5G5CRDK6RD3PGA]<https://pubs.aip.org/aip/app/article/4/1/016101/123128/Realizing-Q-gt-300-000-in-diamond-microdisks-for>

Realizing Q > 300 000 in diamond microdisks for optomechanics via etch optimization<https://pubs.aip.org/aip/app/article/4/1/016101/123128/Realizing-Q-gt-300-000-in-diamond-microdisks-for>
Nanophotonic structures in single–crystal diamond (SCD) that simultaneously confine and co-localize photons and phonons are highly desirable for applications in
pubs.aip.org

Cheers,
Joe

Joseph Losby, PhD

Manager, qLab Operations

joseph.losby at ucalgary.ca

________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Emma Anquillare <eanquillare at gc.cuny.edu>
Sent: July 31, 2024 10:26 AM
To: Labnetwork (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Diamond Etching

[△EXTERNAL]

Hello Lab network!

We have a user that is interested in etching a CVD grown slab of Diamond (Area: 3mmx3mm) about ~300 um thick via CF4/O2 or SF6 plasma (CF4 process described here-
 https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173<https://urldefense.com/v3/__https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173__;!!GekbXoL5ynDpFgM!WxaE7hfA6-iCIfo3iRBj8F1Agt1XD-R1rG2Erff2xgbqNr8azLuLPVme0Bu1-MPWWvbxOATSjMfwV6cW23nVbunPXr7k$> , though they would use a SiO2/ PMMA instead of Al mask and an ICP instead of an RIE).

Here is what I have read on diamond so far:
There is no precedent category for Carbon or diamond in the Cornell CNF materials categories (though SiC was allowed in even the most restricted tools) or in labnetwork. The sputter yield should be very low (~0.2 with Xe at 750ev- though most of the other values we have for comparison were with Ar at 600eV) and I could not find a vapor pressure curve for it. MP/BP at atmosphere is absurdly high (in the thousands) and I don't think the etch temperature would be hot enough for it to degrade to graphite. (Actually- I don't even know if our etcher will get hot enough to prompt the fluorine reaction based on literature, but apparently it has been etched before.) Not a toxic material. We might get HF vapor as a side product but usually figure scrubbers can handle that without further risk or precautions.

Do any facilities out there have experience plasma etching CVD diamond? What level-of-cleanliness tool did you allow it in? Were there any contamination problems (especially relevant to waveguides) or other safety aspects I should be aware of? What cleaning recipe did you use?

Thanks,
Emma

_____________________________________________
Emma Anquillare, PhD
Research Scientist
ASRC Nanofabrication Facility
City University of New York

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