[labnetwork] Fwd: Etching III-V and Chalcogenide materials

[Aju Jugessur]

Hi all,

I am forwarding this message again as I haven’t received any response on this topic yet.

Thanks
Aju

Aju Jugessur Ph.D. MBA.
Senior Director
COSINC
College of Engineering and Applied Science
University of Colorado Boulder




Begin forwarded message:

From: Aju Jugessur <Aju.Jugessur at colorado.edu>
Date: July 30, 2024 at 5:06:17 PM MDT
To: labnetwork at mtl.mit.edu
Subject: Etching III-V and Chalcogenide materials


Hi all,

I am seeking some advice on any potential issues in terms of etch chamber contamination, process reproducibility and device performance (photonic waveguides) in the following scenario:

We have a user etching chalcogenide material for photonic waveguide and ring resonator fabrication and applications. The tool is a PlasmaTherm ICP etcher.
To date, the tool has been dedicated for chalcogenide material etching.
We now have interest from other users who would like to etch GaAs/AlGaAs materials.

Does anyone in the network uses the same etch chamber for these two materials, especially to fabricate photonic structures? If yes, has there been any contamination issues that may impact the etch processes, reproducibility and/or photonic device performance?


Any advice or suggestions would be greatly appreciated.

Thanks so much,
Aju



Aju Jugessur Ph.D., MBA, Sr. Member IEEE
Senior Director
Colorado Shared Instrumentation in Nanofabrication &
Characterization (COSINC)
Member of Inclusive Culture Council (ICC)
University of Colorado Boulder | College of Engineering & Applied Science
4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019|
E-mail: aju.jugessur at colorado.edu<mailto:aju.jugessur at colorado.edu>
Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur
www.colorado.edu/facility/cosinc<http://www.colorado.edu/facility/cosinc>
Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever
(CliftonStrengths)

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