[labnetwork] HBr and Cl2 mixing gases

[MINGWEI LIN]

Hi, All:
Thank you for sharing the experience with us.
We still don't mix F-based and Cl-based gases here, and the tool is dedicated to the F-based or Cl-based chemistries only.
However, it is good to know other experience about how to handle the chemistries and the tool management. I do appreciate that.
Thanks/regards,

MINGWEI LIN, PhD
Process Engineer
Nanoscale Fabrication Center
University of Wisconsin-Madison

________________________________
From: Emma Anquillare <eanquillare at gc.cuny.edu>
Sent: Tuesday, August 27, 2024 4:07 PM
To: MINGWEI LIN <mlin227 at wisc.edu>
Subject: Re: HBr and Cl2 mixing gases

Hi Mingwei,
I would also be very curious to hear about this too!  Our chlorine tool also has both gasses. This is what I do know:

-BCl3 and Oxygen should not mix in the chamber (will form Boric oxide which is a very-hard-to-remove solid ). Usually there is a purge between any steps containing O2 or BCl3
-Flammable gasses and oxygen should never mix in the chamber. The tool software we have prevents against flowing in oxygen with a flammable gas and I instruct people to never mix flammable gasses with any oxidizing gas in the chamber as an additional precaution. So there would also have to be purges between those steps as well, though HBr (though corrosive and toxic)  is not oxidizing or flammable as far as I see.
-Looking at the recipes we have on our tool, we do have some recipes with simultaneous Cl2 and HBr flow. HOWEVER- these recipes were developed by users with no formal oversight or assessment until now, so just because they exist and we've not yet had a problem that I am aware of does not mean this is best practice.

Again, I would also be very curious to learn other peoples' experiences with these gasses and if there is something we should be doing better here as well.


Emma
_____________________________________________
Emma Anquillare, PhD
Research Scientist
ASRC Nanofabrication Facility
City University of New York

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________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of MINGWEI LIN <mlin227 at wisc.edu>
Sent: Tuesday, August 27, 2024 12:30 PM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] HBr and Cl2 mixing gases


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Hi, Everyone:
We are going to purchase a new metal etcher with Cl-based and HBr gases. Can anyone share the experience of HBr and Cl-based mixing gases for the etcher?
1. Can the HBr and Cl2 mixing gases be used together for the Si/Poly Si etch? If Cl2 was used first followed by HBr, would any cleaning be necessary in between?
2. Does anyone know about any impact on III-V materials (GaN for example) etch or device performance if HBr and Cl2/BCl3 are used in the chamber?
3. If there is cross contamination issue about the mixing gases, what about the cleaning criteria if we switch HBr and Cl-based gases back and forth? Any better way for the tool management?
Thanks/regards,

MINGWEI LIN, PhD
Process Engineer
Nanoscale Fabrication Center
University of Wisconsin-Madison

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