[labnetwork] Inset targets on MRC sputtering system

[Robert Carter]

Hello Labnetwork,
Our MRC sputtering tool is currently outfitted with traditional planar
targets, and our target utilization is around 20%. We are considering
upgrading the cathode assembly to accept inset targets, specifically the
upsilon configuration, for precious metal deposition. The documentation on
such targets claim upwards of 60% utilization. Does anyone have experience
with upsilon targets, and are the claimed utilization figures realistic?
Were there any unforeseen headaches you ran into when switching from planar
to inset target configurations?
Thanks,
Robert
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