[labnetwork] Etching III-V and Chalcogenide materials

[Aju Jugessur]

Hi all,

I am seeking some advice on any potential issues in terms of etch chamber contamination, process reproducibility and device performance (photonic waveguides) in the following scenario:

We have a user etching chalcogenide material for photonic waveguide and ring resonator fabrication and applications. The tool is a PlasmaTherm ICP etcher.
To date, the tool has been dedicated for chalcogenide material etching.
We now have interest from other users who would like to etch GaAs/AlGaAs materials.

Does anyone in the network uses the same etch chamber for these two materials, especially to fabricate photonic structures? If yes, has there been any contamination issues that may impact the etch processes, reproducibility and/or photonic device performance?


Any advice or suggestions would be greatly appreciated.

Thanks so much,
Aju



Aju Jugessur Ph.D., MBA, Sr. Member IEEE
Senior Director
Colorado Shared Instrumentation in Nanofabrication &
Characterization (COSINC)
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E-mail: aju.jugessur at colorado.edu<mailto:aju.jugessur at colorado.edu>
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