[labnetwork] PECVD dilute gas question(s)

[Martin, Michael]

Hi Nathan,
   We are using 5% SiH4 in Argon.  We switched to this from 100% SiH4 some years ago after we had a fire while swapping out a tank.  Our stress and other data for nitrides can be found here https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf
In essence, it works for us.

-Michael
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Subject: [labnetwork] PECVD dilute gas question(s)


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Hello Labnetwork,



We have a PECVD system using dilute silane (2%)/N2.  Some labs with similar systems use dilute silane (5%)/helium.  We are nearing the end of our current cylinder and will need a replacement soon.  What are the advantages and disadvantages when choosing the dilute gas?  Does choosing a helium mixture produce more desirable films and/or quality?  In other words, is it worth it to purchase a cylinder with helium?  Also, what would be the reason(s) for using helium as an additional process gas?  E.g., a separate MFC and gas line.



Thank you all in advance.



Nathan C. Aultman

University of Central Florida

407-823-6852

naultman at creol.ucf.edu<mailto:naultman at creol.ucf.edu>


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