[labnetwork] PECVD dilute gas question(s)

[Lino Eugene]

Hi Nathan,

We have 5% silane diluted in N2. Mixture with N2 is not ideal for a-Si:H deposition. The incorporation of nitrogen will lower the refractive index of a-Si:H.

Best,

Lino Eugene, P.Eng., Ph.D.,
Micro/nanofabrication process engineer
Quantum-Nano Fabrication and Characterization Facility
Office of Research
QNC 1611
University of Waterloo
200 University Avenue West
Waterloo, ON, Canada
N2L 3G1

Ph: +1 519-888-4567 #37788
Cell: +1 226-929-1685
Websites:
https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/
https://fab.qnc.uwaterloo.ca/

________________________________
De : labnetwork <labnetwork-bounces at mtl.mit.edu> de la part de Nathan Aultman <naultman at creol.ucf.edu>
Envoyé : lundi, avril 7, 2025 11:47:17 a.m.
À : labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Objet : [labnetwork] PECVD dilute gas question(s)

Hello Labnetwork,

We have a PECVD system using dilute silane (2%)/N2.  Some labs with similar systems use dilute silane (5%)/helium.  We are nearing the end of our current cylinder and will need a replacement soon.  What are the advantages and disadvantages when choosing the dilute gas?  Does choosing a helium mixture produce more desirable films and/or quality?  In other words, is it worth it to purchase a cylinder with helium?  Also, what would be the reason(s) for using helium as an additional process gas?  E.g., a separate MFC and gas line.

Thank you all in advance.

Nathan C. Aultman
University of Central Florida
407-823-6852
naultman at creol.ucf.edu<mailto:naultman at creol.ucf.edu>


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