[labnetwork] Cleanroom humidity

[Matthew Moneck]

Hi Alex,

We have fairly tight control on our systems.  Temperature is 68F +/- 0.5F
and humidity is 40% +/- 2%.

A lot of literature will cite that cleanrooms should be maintained between
30% and 50% humidity.  The higher end of that range (45% - 50%) is
preferred for photolithography.  The lower end is preferred for other
applications, although, as others have pointed out, the most important
thing is to keep temperature and humidity stable to avoid process
shifts.  We do not have the ability to independently control humidity in
different zones, so have compromised towards the middle at 40%.

Best Regards,

Matt


On Wed, Dec 17, 2025 at 9:56 PM Alex Dixon <agdixon at mines.edu> wrote:

> For those of you with climate controls in your cleanrooms, what relative
> humidity do your keep your cleanroom at, and how tightly do you control the
> fluccuations?  How significant an effect have you seen on device
> performance?
>
> Our campus facilities is doing a climate control audit and asking any lab
> with special requirements to justify them. Any info you could share would
> be appreceated.
>
> Thanks!
> -Alex
>
> __________________________________________________________
>
>
> Alex Dixon, Ph.D. (He/Him)
> Lab Manager
> Nanofabrication and Thin Film Deposition
> Shared Instrument Facility
> Colorado School of Mines
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 

--
Matthew T. Moneck, Ph.D
Executive Director, Claire & John Bertucci Nanotechnology Laboratory
Electrical & Computer Engineering | Carnegie Mellon University
5000 Forbes Avenue, Pittsburgh, PA 15213-3890
Phone: 412-268-5430
ece.cmu.edu
nanofab.ece.cmu.edu
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20251218/8d04c7d7/attachment.html>