[labnetwork] Photoresist and Ebeam Resist In Same Spinner?

[Golan Tanami]

Hi Grant,

After consulting with my team cc’d here, there may be two possible reasons that perhaps facilitate this separation:


  1.  Avoiding potential contamination, ease of cleanup etc.
  2.  E-Beam resist is not sensitive to light, thus you’d prefer working under natural lighting conditions (i.e., white light), whereas photoresist (PR) is sensitive to white light (incl. UV) and this is why yellow lightning is a must. To avoid situations where one may bring PR coated wafer into E-beam spinner that works at the environment of white light, physical separation between the two is necessary.

Best,

Golan.



[cid:image001.jpg at 01DB82E8.3CED4D90]
Golan A. Tanami, PhD | Head of the Unit for Nanofabrication (UNF)

Center for Nanoscience and Nanotechnology
Edmond J. Safra Campus
The Hebrew University of Jerusalem
T +972.2.6584179 | M +972.50.9891111
golant at savion.huji.ac.il<mailto:golant at savion.huji.ac.il>
Website: https://nano.huji.ac.il/UNF


From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Grant Shao
Sent: Wednesday, February 19, 2025 4:27 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?

Hello Labnetwork,

I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this, but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?

Thanks,
Grant

--
Grant Shao
Nanofabrication Operations Manager
Stanford Nano Shared Facilities<http://snsf.stanford.edu/>

shaog at stanford.edu<mailto:shaog at stanford.edu> | 650.441.9042
Spilker Building, Room 004
348 Via Pueblo
Stanford, CA 94305-4088
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