[labnetwork] a-Si PECVD ↑ uniformity

[Demis D. John]

Does anyone have processes for higher uniformity for amorphous Silicon
PEVCD dep?
On both our PECVD tools, the a-Si recipes are extremely non-uniform (~50%
reduced rate from center to edge of the platen!).

The user has tried ↑ SiH4 flow, and ↑ ↓ Bias Power.  They may have tried
pressure as well, but no dice yet.

Does any one have experience with how to improve this?

Thanks!
-- Demis

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