[labnetwork] Cleanroom gowning to handle resists and developers

[Prashant Srinivasan]

Mario,

There are two parts to this. Isolating the chemistries from each other 
and protecting the user. We have installed spin coaters in independent, 
flow controlled benches. Likewise with developers (AZ 400K 1:4, 
AZ300-MIF). Our users handle resists and developers _with standard 
cleanroom attire_ (Nitrile  gloves, bunny suit, wrap around goggles).

(Although this isn't part of your question, some additional information)

  * RCA/Piranha PPE -  Tychem Apron, +2 pairs of Microflex 93-260 (3
    pairs of gloves total), full coverage face shield.
  * HF PPE - PVC Apron, same PPE as above.

My users are inexperienced students enrolled in our cleanroom classes, 
hence the maximalist approach with single use gloves. Other labs I know 
use one pair of trionic gloves for corrosives, which they reuse.

Prashant

On 4/20/2026 3:37 PM, Beaudoin, Mario wrote:
>
> Dear Network,
>
> In our cleanrooms, we handle photoresists and developers with common 
> cleanroom apparel (coveralls, hoods, nitrile gloves and eye 
> protection).  Do any of you require extra special aprons, full visors 
> and 4H gloves?  I've worked in many cleanrooms and never encountered 
> such requirements.
>
> Mario
>
> -- 
>
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-- 
Prashant Srinivasan,
Teaching Cleanroom Engineer
Electrical & Computer Engineering
University of California, Santa Barbara
Santa Barbara, California 93106
https://www.ece.ucsb.edu/department-resources/electronics-shop/tcr
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