[labnetwork] Cleanroom gowning to handle resists and developers

[Garry J. Bordonaro]

Mario,

 

We require safety glasses, face shield, and nitrile gloves while using photoresist spinners, and at the wet bench for handling and developing.  No aprons, and no special protection provided that there is adequate ventilation. For spills, heavier gloves and possibly a respirator would be needed.

 

Garry J. Bordonaro

Microlithographic Engineer

Cornell NanoScale Facility

250 Duffield Hall

343 Campus Road

Ithaca NY 14853-2700

(607) 254-4936

 <mailto:bordonaro at cnf.cornell.edu> bordonaro at cnf.cornell.edu

 <http://www.cnf.cornell.edu/> http://www.cnf.cornell.edu/

 

Please acknowledge CNF in your publications:

"This work was performed in part at the Cornell NanoScale Science & Technology Facility (CNF), a member of the National Nanotechnology Coordinated Infrastructure (NNCI), which is supported by the National Science Foundation (Grant NNCI-2025233)."

 

 

 

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Beaudoin, Mario
Sent: Monday, April 20, 2026 6:38 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cleanroom gowning to handle resists and developers

 

Dear Network,

In our cleanrooms, we handle photoresists and developers with common cleanroom apparel (coveralls, hoods, nitrile gloves and eye protection).  Do any of you require extra special aprons, full visors and 4H gloves?  I've worked in many cleanrooms and never encountered such requirements.

Mario

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