[labnetwork] DUV Resist choice

[Vaibhavi G.K.]

Hello

I have been studying the change in resist types used for i-line and 248nm
DUV, and I now understand the fundamental reasoning behind the shift from
i-line to CAR resists. Given the huge library of positive CAR DUV resists,
how do I pick one most likely to work out for an application like a CMOS
350nm process flow for instance? Many such resists have the required
resolution for 1µm film thickness, but the same resist must also be robust
to high dose implants and withstand etching. I would like some suggestions
for a reliable ~1um resist already used in a CMOS process, for say a CD of
350nm?

Vaibhavi GK
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