[labnetwork] UV Bake for Ion Implantation

[Vaibhavi G.K.]

Hello!

I was curious to understand if UV Baking is mandatory for a high dose ion
implantation, such as 10E14 /cm2 or higher as I read many articles where it
is done to avoid resist popping. But can ion implantation be done with a
successful post resist strip without this UV Bake step, using just a hard
bake (at a temperature where resist reflow is negligible)? I studied the
open-source UCB Process flow and saw that they included the UV Bake, but
there were also a few trials using only a hard bake. If we use only a hard
bake, will that work for any 248nm DUV resist? I was looking for clarity on
this aspect.

Vaibhavi GK
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