[labnetwork] CVD Diborane Diffusion

[Siva Penmetsa]

Hi All,

We do the process in Horizontal Hot Wall Atmospheric CVD using Single
Crystal N Type Silicon wafer
The gas used for Boron diffusion is 1% Diborane in Argon
We use Nitrogen as the carrier gas.
I sincerely thank you for the inputs from Labnewtwork.


 Thanks & Regards,
*Siva Prasad Raju Penmetsa*
*Senior Facility Technologist*
National Nano Fabrication Center
*Indian Institute of Science(IISc)*
Bangalore, India 560 054
On Thu, Aug 9, 2012 at 7:44 AM, Siva Penmetsa <sivapenmetsapr at gmail.com>wrote:

> Hi All,
>
> We are trying to optimise Diborane furnace in a new CVD equipment.
>
> We have performed few trials(all the souces are gases) at
>
> Temperature 1000 C
> Diborane Flow rate in the range 40 sccm to 100 sccm
> Oxygen flow rate 2 SLPM
> Nitrogen flow rate is 3 SLPM
> Time 30 minutes
>
> Instead of decrese in resistance we observed that the resistance incresed
> to around 500 ohm/sq from around 50 ohm/sq
>
> We apprecite your experience and inputs on how we can resduce the
> resisitivity with better Diborane diffussion.
>
> --
> Thanks & Regards,
> *Siva Prasad Raju Penmetsa*
> *Senior Facility Technologist*
> National Nano Fabrication Center
> *Indian Institute of Science(IISc)*
> Bangalore, India 560 054
>  <siva at cense.iisc.ernet.in>
>
>


-- 

 <siva at cense.iisc.ernet.in>
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