[labnetwork] LPCVD SiC

[Fred Thomas]

This (free!) chapter from MEMS Materials and Processes Handbook titled "Additive Processes for Semiconductors and Dielectric Materials" lists propane, ethylene, acetylene, disilabutane, tetramethylsilane, trimethylsilane, and trimethylaluminum as carbon sources. Methylsilane is an important one that they left out. If the link doesn't work, try searching for the chapter title and the pdf will be the first page listed.

http://www.google.com/url?sa=t&rct=j&q=&esrc=s&source=web&cd=1&ved=0CDAQFjAA&url=http%3A%2F%2Fwww.springer.com%2Fcda%2Fcontent%2Fdocument%2Fcda_downloaddocument%2F9780387473161-c1.pdf%3FSGWID%3D0-0-45-1102942-p173695513&ei=mIwzUpPtPM782gXb4ICwDw&usg=AFQjCNEUvzbTp8tR2HVNu2RVHSla8B6O5A

Best regards,

Fred Thomas, Ph.D.
Research Scientist
TystarCorporation

369 Van Ness Way #702, Torrance, CA 90501
Phone 310.781.9219 ext. 334 
Fax: 310.781.9438
*fred at tystar.comhttp://www.tystar.com

Celebrating 25
Years of Business! 9/12/88 – 9/12/13




________________________________
 From: "Morrison, Richard H., Jr." <rmorrison at draper.com>
To: "<labnetwork at mtl.mit.edu>" <labnetwork at mtl.mit.edu> 
Sent: Thursday, September 12, 2013 10:30 AM
Subject: [labnetwork] LPCVD SiC
 


 
Hi All,
 
I am planning a retro fit of our LPCVD stack, I want to remove LTO and replace with SiC. We have methane in the fab for our PECVD SiC process can I use that on an LPCVD process or is another feed gas better suited to SiC process?
 
Thanks in Advance.

Rick
 
 
Draper Laboratory
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563
 
www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461
 
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