[labnetwork] need help with photolithography
Leif Johansen
lej at danchip.dtu.dk
Thu Jan 28 02:54:31 EST 2016
Hello Rick,
At DTU Danchip we have a Canon FPA-3000 EX4 DUV stepper with a KrF excimer laser at 248 nm wavelength which is set up to handle 150 mm wafers. The nominal resolution limit specified by Canon is 250 nm, but we have obtained 160 nm for straight lines and spaces. The exact resolution limit is very dependent on the actual pattern and, of course, also on the resist thickness.
Best regards,
Leif
Leif S. Johansen
Head of Operations
DTU Danchip
Technical University of Denmark
[http://www.dtu.dk/images/DTU_email_logo_01.gif]
Danchip
Ørsteds Plads, Byg. 347
2800 Lyngby
Direct +45 45255713
Mobile +45 25348992
lesjo at danchip.dtu.dk<mailto:lesjo at danchip.dtu.dk>
www.danchip.dtu.dk/<http://www.danchip.dtu.dk/>
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr.
Sent: 27. januar 2016 14:39
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] need help with photolithography
HI,
I am working on a project that requires photolith at 100nm, I have access to an E-Beam but I was wondering if anybody has DUV stepper for 150mm wafers working at 100nm line space that Draper could use.
Thanks in advance.
Rick
Draper
Principal Member of the Technical Staff
555 Technology Square
Cambridge Ma, 02139-3563
www.draper.com<http://www.draper.com>
rmorrison at draper.com<mailto:rmorrison at draper.com>
W 617-258-3420
C 508-930-3461
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