[labnetwork] Project Feasibility for RIE

Luciani, Vincent (Fed) Vincent.Luciani at nist.gov
Mon Oct 17 10:59:52 EDT 2016


Hello,

I checked with our RIE chemist.  He does not have direct experience with these chemicals but offered the following comments.

Based on the formula, the film is a solid polymer (CH2CHCO(C2H4O)nCOOCHCH2) blended with the ionic liquids (C8H15BF4N2+ AgBF4+ C10H12O2) inside. It is a Carbon based film, so normal Oxygen plasma should etch it. The concern is if the small molecular organic compounds (C8H15BF4N2 and C10H12O2) will vaporize inside the high vacuum plasma chamber which may change the electrolyte chemical composition and contaminate the plasma system.

Best,
Vince Luciani


Vincent K. Luciani
NanoFab Manager
Center for Nanoscale Science and Technology<http://www.cnst.nist.gov/>
National Institute of Standards and Technology
100 Bureau Drive, MS 6201
Gaithersburg, MD 20899-6200 USA
+1-301-975-2886




From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Abelev, Esta
Sent: Thursday, October 13, 2016 12:53 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Project Feasibility for RIE

Hi,

I would like to introduce myself, I am Esta Abelev a Technical Director of Nanoscale Fabrication facility at University of Pittsburgh.
Recently, I received request to etch following materials (see below table), that I have never worked with. I wanted to ask the community if somebody have an experience with those materials and how the best way to etch it.

Need to etch the polymer electrolyte (salt concentration is 2.5 mM based on the volume of Ionic liquid. And PEGDA/IL is 60/40 wt.%) on the silicon substrate except those areas protected by metal. The chemical formulas for these materials are as follows:

Name


Chemical Formula


Polyethylene glycol dicrylate


CH2CHCO(C2H4O)nCOOCHCH2


1-butyl-3-methylimiadazolium tetrafluoroborate


C8H15BF4N2


Silver tetrafluoroborate


AgBF4


2-Hydroxy-2-methylpropiophenone


C10H12O2


Thank you, Esta

.........................................................................................................................................................................................
Dr. Esta Abelev

Technical Director of PINSE/NFCF
Petersen Institute of NanoScience and Engineering (PINSE)
Nanoscale Fabrication and Characterization Facility (NFCF<http://www.nano.pitt.edu/facilities>)
University of Pittsburgh
636 Benedum Hall
3700 O'Hara Street
Pittsburgh, PA 15261

Phone: 412-383-4096
Email: eabelev at pitt.edu<mailto:eabelev at pitt.edu>
Office: M104 Benedum Hall
http://www.nano.pitt.edu


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