[labnetwork] KOH etch of silicon

[Chen Yulong (Frank)]

Hi mario beaudoin and Mathilde Isabelle Barriet

The KOH etch condition used in my lab is 40% by weight and 50 degree Celsius.

You can get the etch rate by http://www.lelandstanfordjunior.com/KOH.html, 

I use electronic grade KOH solution provided by China supplier, so I didn`t check the metal contamination. If you want to remove the potassium ion after the etch process is done, I recommend you put the wafer into hot or boiled water or SC-2 of the RCA clean.

Regards,



陈宇龙(CHEN Yulong) PhD Student
Department of Materials Science and Engineering
SUSTech  http://www.sustc.edu.cn/en/
Tel: +86-18589050065
 
 
From: Mario Beaudoin
Date: 2017-08-23 02:26
To: labnetwork
Subject: Re: [labnetwork] KOH etch of silicon
Transene sells Si etchants and the condensing glassware to do these types of jobs.  http://transene.com/si/

Le 11/08/2017 à 6:03 AM, Mathilde Isabelle Barriet a écrit :
Dear All,
I have a user who wants to do KOH etch of silicon but since we do not have an established process in the lab, I am wondering if I could get some practical guidance on the best set ups.
Also, this user is especially concerned about contaminating his Si wafers with metals so I wonder what degree of purity of KOH is commonly used and if buying the best quality available make a difference on the Si contamination or not.
If anyone has experience with this, please let me know.
Thanks
Mathilde
Senior Engineer
NTNU NanoLab
----------------------------
Sem Sælands vei 14, K1-113
NO-7491 Trondheim
+47 91 89 72 08
www.ntnu.no/nanolab
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-- 
Mario Beaudoin, Ph.D.
Research Associate
Advanced Nanofabrication Facility (ANF)
Advanced Materials and Process Engineering Lab (AMPEL)
University of British Columbia
2355 East Mall, Vancouver, BC V6T 1Z4
Tel: 604-822-1853
web: www.nanofab.ubc.ca
Reply To: beaudoin at physics.ubc.ca
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