[labnetwork] Raith vs. Elionix E-beam writers

[Jugessur, Aju S]

Kevin,

We have the latest Raith Voyager and also commissioned the Vistec 5000plus at UofT.

If you want to discuss these tools, it might be best to chat offline.

Thanks
Aju

On Oct 3, 2017, at 6:50 AM, Kevin McPeak <kmcpeak at lsu.edu<mailto:kmcpeak at lsu.edu>> wrote:

Dear Colleagues,

My colleagues at Tulane University and I recently were awarded an NSF
MRI grant for an E-beam lithography system. We are currently looking
at two different suppliers for this system, Raith and Elionix. For
Raith we are looking at their Voyager100 (50 kV) and E-Line Plus (30
kV) systems and for Elionix we are looking at their latest ELS-S50EX
(50 kV) model. All three systems have been placed within our budget.

Our group of e-beam writers is interested in achieving both large
single field sizes of periodic arrays of nanostructures (e.g. ~200 nm
features over 500 um x 500 um region) and excellent stitching accuracy
for writing 5 mm x 5 mm arrays of nanostructures.

I would appreciate any input you have on using Raith and Elionix
systems for high-performance e-beam writing (i.e. custom support,
usability, uptime, etc.)

Thank you.

Regards,
Kevin

--
Kevin M. McPeak
Assistant Professor
Louisiana State University
Dept. of Chemical Engineering
110 Chemical Engineering Bldg Room 324
S. Stadium Drive
Baton Rouge, LA  70803
email: kmcpeak at lsu.edu<mailto:kmcpeak at lsu.edu>
phone: 225-578-0058

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Aju Jugessur, Ph.D.
Director, University of Iowa Microfabrication Facility (UIMF)
Optical Science and Technology Center
Professor Adjunct, Physics and Astronomy
University of Iowa
Office: IATL 202, Tel: 319-3532342
Labs: IATL 170, 172, 174
https://ostc.uiowa.edu/uimf






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