[labnetwork] ITO deposition

[Aebersold,Julia W.]

Sometimes we will run the sample in our anneal furnace with O2 flowing if extra transparency and lower resistivity is needed.


Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292

(502) 852-1572

http://louisville.edu/micronano/<http://louisville.edu/micronano>


________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Brent Gila <bgila at ufl.edu>
Sent: Tuesday, April 9, 2019 4:14:20 PM
To: Iulian Codreanu
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] ITO deposition

Hello Iulian,

We have sputtered ITO here in our multi-user sputter tool without any
indium or tin issues.  However, there are some tricks to controlling the
conductivity of the sputtered ITO and that involves dialing in just the
right amount of O2 background in the system.  We would load the ITO
target overnight and run the dep first thing the following morning to
ensure a low O2 and H2O background.  Our tool is a KJL CMS 18 sputter
tool and KJL was helpful in providing some starting points with the
recipe.  We had to still tweak the recipe, but that is not uncommon.

Best Regards,
Brent
--
Brent P. Gila, PhD.
Director, Nanoscale Research Facility
1041 Center Drive
University of Florida
Gainesville, Florida 32611
Tel:352-273-2245
Fax:352-846-2877
email:bgila at ufl.edu




On 4/9/2019 12:54 PM, Iulian Codreanu wrote:
> Dear Colleagues,
>
> We have received a number of requests to provide ITO deposition
> capabilities. We have a sputterer but are concerned with the low
> melting points for Indium and Tin.  I am under the impression that ITO
> needs a dedicated deposition system. What is your experience/advice?
>
> Thank you,
>
> Iulian
>


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