[labnetwork] Fwd: Nanofab staff opening at UIowa

[Joseph E. Palmer]

Please excuse me, as I help spread the word on the job opportunity 
below. - J. Palmer

I am reaching out to you today to see if you can help spread the word 
for a job opening at our nanofabrication facility: 
https://uiowa.referrals.selectminds.com/jobs/core-facility-research-specialist-3341 
which is equipped with these tools:

·Direct-write Electron-Beam Lithography (recently purchased): high speed 
pattern 
generatoronthenano-scalewithsub-20nmresolutionpatterningcapabilityandplacement 
accuracy.

·Electron Beam Lithography Proximity effects control software: GenISys 
Beamer: control the electron beam dose and electron scattering effects 
for various pattern geometries and densities.

·Optical lithography: OAI Model 800 mask aligner with back-side 
alignment capabilities for pattern exposures down to 1µm.

·Thin-film deposition: Electron-beam deposition system (Angstrom 
Engineering 450) and Thermal evaporator (Edwards Auto 306) for coating 
conformal thin metal layers down to sub-10 nm thickness with highuniformity.

·Plasma etcher: Reactive ion etchers (RIE) (Oxford PlasmaPro NGP 80) and 
ICP Plasma Pro S100 for the etching of various semiconductor and 
insulation materials with features on the micro- and nano-scale using 
several gas chemistries. These tools offer anisotropic etching on 
various materials that include glass, silicon, III-V materials, metals 
with near verticalsidewalls.

·Atomic Layer deposition (ALD): The ALD system (Oxford Opal) provides 
the ability to precisely coat materials at the atomic level conformally 
using sequential and self-limiting surface reactions. This tool is used 
to deposit a wide range of materials, including oxidessuch as TiO_2 , 
SiO_2 , ZnO, HfO_2 and Nitrides, TiN, Si_3 N_4 and metals such as Ru, 
Pt, with a typical uniformity of < 2 % and provides excellent step 
coverage even inside high aspect ratiostructures.

·NanoimprintLithography:Thetool(NanonexNX-1006)isafullwafernanoimprintorwith 
thermal imprint capability. This tool is capable of imprinting features 
on the micro- and 
nano-scaleoverlargeareasinthecentimeterranges–suitableforlow-costandlarge-scale 
fabrication.

·Thin-film sputtering system: The tool (Intlvac Nanochrome 1) uses any 
combinations ofRF, AC and DC magnetron sputtering cathodes to produce 
thin films (including Si, SiO_2 , Si_3 N_4 ) for precision coatings on a 
wide range ofmaterials.

·Plasma cleaner: The tool (Branson 3100) uses an oxygen plasma to remove 
thin layers of polymer on semiconductor or insulatingmaterials.

·Wet-processing: Several laminar flow wet-benches and hoods are 
available for wet- processing using a wide range of solvents and acids 
for wetetching.

The salary and benefits are competitive. For more information, the 
interested party can contact me directly as well, and I can connect them 
to the hiring manager. Thanks.

Regards,

Fatima

--------------------------------------------------------------------------------------------------------------------

Fatima Toor, Ph.D.

Assistant Professor

Electrical & Computer Engineering

Physics & Astronomy

UI Informatics Initiative (UI3)

Center for Computer Aided Design (CCAD)

Iowa CREATES and MATFab Facility

Affiliate Member, Holden Comprehensive Cancer Center - Experimental 
Therapeutics

Office: 116 Iowa Advanced Technology Laboratories (IATL)

205 N. Madison Street, The University of Iowa, Iowa City, IA 52242-1727, USA

Phone: +1 (319) 335-6071

Fax: +1 (319) 335-6028

https://ftoor.lab.uiowa.edu/

Technical Group Development Chair, OSA Board of Meetings

Associate Editor, SPIE Journal of Photonics for Energy 
<https://www.spiedigitallibrary.org/journals/journal-of-photonics-for-energy?SSO=1>

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