[labnetwork] HSQ developer compatible with AlN for electron beam lithography (EBL)

[Edmond Chow]

Hello,

We are trying to pattern HSQ with EBL on AlN film substrate,. We typically
use 2.2%TMAH (MF 319)as our HSQ developer.
However TMAH will attach AlN film and cause problem for our sample.

Does anyone has some HSQ developer that is compatible with AlN?

Thanks.

Edmond
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