[labnetwork] Universal standards of microfab enviornment

[Matthias Pleil]

In addition, relative humidity is critical in photolithography, many photoresists require re-hydration after soft bake and before exposure.  Low humidity will cause patterning problems (been there, done that).

Kind Regards,

Matthias Pleil, Ph.D.
Research Professor & Lecturer III of Mech. Eng - UNM
UNM MTTC Cleanroom Manager
PI - Southwest Center for Microsystems Education, Support Center for Microsystems Education
scme-nm.org, scme-support.org
(505)272-7157
________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Paolini, Steven <spaolini at cns.fas.harvard.edu>
Sent: Wednesday, March 6, 2019 3:21 PM
To: Xin (Shane) Guo; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Universal standards of microfab enviornment


Shane,

   The most often referenced material is from SEMI standards.  Semistandards.org

Whatever criteria you adopt, please note that it is of the utmost importance to ensure consistency. If temperature and RH vary, it will introduce unwanted variables in sensitive and complex processes. Another important point is to keep the RH relatively high (48%) to reduce ESD. If the RH and temperature fluctuate, you will encounter variation in your photo speed.

Hope this helps.

Steve



Steve Paolini

Principal Equipment Engineer

Harvard University Center for Nanoscale Systems

11 Oxford St.

Cambridge, MA 02138

617- 496- 9816

spaolini at cns.fas.harvard.edu

www.cns.fas.harvard.edu



From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Xin (Shane) Guo
Sent: Wednesday, March 06, 2019 1:30 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Universal standards of microfab enviornment



Hi Colleagues,



Is there a universal standard for microfabrication cleanroom, outlining the requirement of humidity, temperature, noise, etc?



Any documentation available?



Cheers



Shane



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