[labnetwork] Universal standards of microfab enviornment

[Xin (Shane) Guo]

Hi Steven,

That's great information!

I think a RH of 45% and temperature of 20+/-2oC will work for most of our applications.

Cheers

Shane



On Wed, Mar 6, 2019 at 5:21 PM Paolini, Steven <spaolini at cns.fas.harvard.edu<mailto:spaolini at cns.fas.harvard.edu>> wrote:
Shane,
   The most often referenced material is from SEMI standards.  Semistandards.org
Whatever criteria you adopt, please note that it is of the utmost importance to ensure consistency. If temperature and RH vary, it will introduce unwanted variables in sensitive and complex processes. Another important point is to keep the RH relatively high (48%) to reduce ESD. If the RH and temperature fluctuate, you will encounter variation in your photo speed.
Hope this helps.
Steve

Steve Paolini
Principal Equipment Engineer
Harvard University Center for Nanoscale Systems
11 Oxford St.
Cambridge, MA 02138
617- 496- 9816
spaolini at cns.fas.harvard.edu<mailto:spaolini at cns.fas.harvard.edu>
www.cns.fas.harvard.edu<http://www.cns.fas.harvard.edu>

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Xin (Shane) Guo
Sent: Wednesday, March 06, 2019 1:30 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Universal standards of microfab enviornment

Hi Colleagues,

Is there a universal standard for microfabrication cleanroom, outlining the requirement of humidity, temperature, noise, etc?

Any documentation available?

Cheers

Shane




--
Shane GUO, PhD  Facility Manager
SPaRC Microfabrication Laboratory
York University | Bergeron Centre for Engineering Excellence | Office: BRG037

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