[labnetwork] ALD venting precautions

[Zuzanna A. Lewicka]

Dear Labnetwork Community,


We are trying to get more information about appropriate venting precautions (e.g. proper exhaust abatement system or just heated ALD trap) for Thermal Atomic Layer Deposition System configured for alumina, hafnia and titania on Si, GaAs, and InP substrates. We would appreciate if you could share your experiences and solutions at your facilities.

Thank you,
Zuzanna Lewicka


Senior Research Specialist

Princeton Institute for the Science and Technology of Materials (PRISM) Cleanroom

Email: zlewicka at princeton.edu<https://owa.princeton.edu/owa/redir.aspx?C=_objl9mq7yUMTgAiqvOi4fXDy7oF3uDvC7guzRPqpQi1k7GZDK_VCA..&URL=mailto%3azlewicka%40princeton.edu>


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