[labnetwork] TDMAS SiO2 recipe on a Beneq system

[Sam Tsitrin]

Hi Michael-
we don't have a Beneq here but we have used TDMAS with our Fiji200, with O2
plasma as the oxygen source.
I'm not sure if the pulse, purge times would be relevant for a different
chamber. We kept TDMAS at room temperature and have done depositions of
SiO2 at substrate temp of 100C-250C.
Recently we have also tried BTBAS (heat to 50C)  for our SiO2 film with
some decent results.
Best,
Sam

On Wed, Jul 14, 2021 at 8:40 AM Martin,Michael David <
michael.martin at louisville.edu> wrote:

> Hi guys,
>     Would anyone be willing to share process details for using TDMAS
> (Tris(dimethylamino)silane) on a Beneq ALD system?  Beneq tells me they do
> not have experience with that precursor.  Barring a recipe for the
> particular tool, it would be helpful to just have a general starting point
> such as precursor temperature, injection and purge times, substrate
> temperature, ozone flow rate, etc.  There seems to be a frustrating lack of
> detail in the literature and I have a customer that is chomping at the bit
> to get SiO2 down.
> <https://www.sigmaaldrich.com/US/en/substance/trisdimethylaminosilane1613215112897?context=product>
>
> Regards,
>    Michael
>
> Senior Process Engineer
>
> Micro/Nano Technology Center
>
> University of Louisville
> (502) 852-7671
>
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-- 
Sam Tsitrin

R&D Engineer
UC Berkeley Marvell Nanolab
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