[labnetwork] TDMAS SiO2 recipe on a Beneq system

[Eric Deguns]

Good morning Martin,

I'm the product manager for the Savannah and Fiji ALD products for Veeco
(formerly Cambridge NanoTech).

We've previously used HSi(NMe2)3 or TDMASi in the past for SiO2
depositions.  Most of our thermal users have moved away from this Si
molecule for a few reasons:

- it is slow to saturate
- it requires an extended dose of O3 to fully react and provide a high
quality film

In our ALD systems, we use the stopvalve to isolate the chamber from
dynamic vacuum and expose the substrate to a long(ish) dose of HSi(NMe2)3
and O3.  Consider 15-30 seconds.  I'm not sure that the TFS-200 that you
have (please confirm the model number) can do extended exposures of
precursors.  (You might need to dose a lot of precursor to get saturation -
definitely not a good thing for your vacuum pumps).

Here is an old conference presentation to some prior work we've done with
HSi(NMe2)3 and O3:
https://www.seas.upenn.edu/~nanosop/documents/SiO2fromTDMASandozone_ALD2011.pdf

There are certainly more recent thermal SiO2 precursors available out
there. If there isn't a compelling reason you need to use HSi(NMe2)3 it
might be better to pick a different Si source.

Also a friendly reminder that Veeco provides process recipes and support to
our customers (past and present). We also offer depositions in our
applications lab if that might be helpful for your end user.

Feel free to reach out to me at edeguns at veeco.com.

Best,

Eric








On Wed, Jul 14, 2021 at 11:38 AM Martin,Michael David <
michael.martin at louisville.edu> wrote:

> Hi guys,
>     Would anyone be willing to share process details for using TDMAS
> (Tris(dimethylamino)silane) on a Beneq ALD system?  Beneq tells me they do
> not have experience with that precursor.  Barring a recipe for the
> particular tool, it would be helpful to just have a general starting point
> such as precursor temperature, injection and purge times, substrate
> temperature, ozone flow rate, etc.  There seems to be a frustrating lack of
> detail in the literature and I have a customer that is chomping at the bit
> to get SiO2 down.
> <https://www.sigmaaldrich.com/US/en/substance/trisdimethylaminosilane1613215112897?context=product>
>
> Regards,
>    Michael
>
> Senior Process Engineer
>
> Micro/Nano Technology Center
>
> University of Louisville
> (502) 852-7671
>
> Web page: https://louisville.edu/micronano
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>
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