[labnetwork] FW: Large-scale Nanopatterning

[Matthias Keil]

Dear Long

You can use our Canon DUV stepper (lambda= 284 nm). We usually use 6” wafers. If you are interested, please contact us.

Best regards,
Matthias

Matthias Keil, M.Sc. Ph.D.
Technical University of Denmark
Danchip
Ørsteds Plads
Building 347
2800 Kgs Lyngby
Direct: +45 452 56 492
Lab: +45 452 55 947

makei at dtu.dk<mailto:makei at dtu.dk>
www.nanolab.dtu.dk<http://www.nanolab.dtu.dk>

[http://www.dtu.dk/images/DTU_email_logo_01.gif]



From: Rebecca Bolt Ettlinger <reet at dtu.dk>
Sent: 10. marts 2022 11:58
To: Matthias Keil <makei at dtu.dk>
Subject: FW: [labnetwork] Large-scale Nanopatterning

Hi Matthias,

I saw this on labnetwork, just if you are interested.

Best,
Rebecca

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Chang, Long
Sent: 7. marts 2022 16:17
To: Chang, Long <lvchang at Central.UH.EDU<mailto:lvchang at Central.UH.EDU>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Large-scale Nanopatterning

Hello Everyone,

I appreciate the quick responses. The recommendations is either interference lithography or ASML stepper. The stepper is most suitable for this project so I’ll be reaching out to individuals to learn more.

Thanks,
Long

On Mar 4, 2022, at 3:33 PM, Chang, Long <lvchang at Central.UH.EDU<mailto:lvchang at Central.UH.EDU>> wrote:

Hello,

I need to print 300nm dots with center to center spacing of 500nm on a hexagonal lattice. Currently doing it with EBL, but need to do it faster and cheaper. What are my options? Can this be done with a Stepper somewhere?

Thanks,
Long

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