[labnetwork] PRS-2000 replacment

[John Ransom]

A fab that I worked in a few years ago used Gensolve.  I don’t know exactly what version, but searching “Gensolve resist stripper” brings up a website  from vwr and I am sure you could call them to get the right chemical for you. There was an earlier reply that mentioned EKC after a long plasma etch – I second that recommendation.  If you have Si containing polymers, you will need an EKC type of chemical to break down the polymer.  It is classic in older semiconductor fabs to strip resist after an oxide via or contact etch to use EKC.  It removes “via crowns”.
Good Luck

John Ransom
Program Manager – MUSiC Facility
Multi-User SiC Fabrication Facility
University of Arkansas



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Katharine Beach
Sent: Thursday, September 22, 2022 3:02 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] PRS-2000 replacment

We've been using PRS-2000 for our positive resist strip for years. Due to some supply chain issues, we are considering updating our supplied chemicals. I was wondering what photo resists stripers others are using and would recommend.

Thanks,
Katharine Beach
Lurie Nanofabrication Facility
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