[labnetwork] low temperature ALD deposition

[Gila,Brent P]

Hello Esther

Since you have a Fiji tool I would reach out to ALD support at Veeco. 
Their recipe support is top notch and they can guide you on HfO2 
deposition. If you are using the standard Hafnia precursor (TDMAHf) it 
is very sticky at low temperature. We discovered this when a section of 
our jacket heater failed and the uniformity of the film was horrible.  
And that was at 200C deposition temperature. I can only imagine how non 
uniform and particulate forming that precursor can be at 100C.

Best regards,
Brent
-- 
Brent P. Gila, PhD.
Associate Director, Research Service Centers
University of Florida
1041 Center Drive
Gainesville, Florida 32611
Tel:352-273-2245,  Fax:352-846-2877
email: bgila at ufl.edu


On 12/2/2024 10:49 AM, Abelev, Esta wrote:
> *[External Email]*
>
> Dear Colleagues,
>
> A group at our University is trying to deposit HfO2 at low 
> temperatures (80C and 100C) by ALD techniques.
>
> Currently, the group is using our Fiji200 instrument located in share 
> user cleanroom, unfortunately we have seen a lot of particulates after 
> those depositions, specially if the following user will deposit films 
> at much higher temperatures like 250C.
>
>  1. If anyone has an experience of low temp ALD depositions and can
>     advise on process conditions or some cleaning procedures, we can
>     implement to reduce post low temp particles. Please advice.
>  2. Parallel we are looking potentially purchasing a dedicated
>     instrument for low temp ALD deposition, if someone has an advice
>     on the instrument, please do? We were suggested maybe to go with
>     ANRIC Technologies tabletop unit, is someone familiar with this
>     vendor and their systems?
>
> Best, Esta
>
>
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