[labnetwork] Forming gas: 5% or 10% hydrogen

[Jing Guo]

Hi Mario, 

We also use 5% H2 in N2 as our forming gas on RTP system. 


Jing
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX 
jeanne.guo at rice.edu
713-348-8227







> On Feb 29, 2024, at 6:35 AM, Golan Tanami <golant at savion.huji.ac.il> wrote:
> 
> Hi Mario,
>  
> I don’t know about “the best”, but in our RTA, we use 5% H2 and 95% N2. I think it’s pretty standard.
>  
> Anyway, nobody complained yet 😊
>  
> Best regards,
>  
> Golan.
>  
> <image001.jpg>
> Golan A. Tanami, PhD | Head of the Unit for Nanofabrication (UNF)
>  
> Center for Nanoscience and Nanotechnology
> Edmond J. Safra Campus
> The Hebrew University of Jerusalem
> T +972.2.6584179 | M +972.50.9891111
> golant at savion.huji.ac.il <mailto:golant at savion.huji.ac.il>
> follow us on Facebook <https://www.facebook.com/hujinanocenter/> @hujinanocenter
>  
>  
> From: labnetwork <labnetwork-bounces at mtl.mit.edu <mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Beaudoin, Mario
> Sent: Tuesday, February 27, 2024 10:27 PM
> To: labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> Subject: [labnetwork] Forming gas: 5% or 10% hydrogen
>  
> Dear Network,
> 
> We're setting up a new RTA and will run it with Ar, N2 and forming gas.  We're uncertain about the % level of hydrogen we want in our forming gas.  Can someone recomment the best hydrogen % to use for MOS capacitor annealing?
> 
> Regards,
> 
> Mario
> 
> -- 
> <image002.jpg>
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