[labnetwork] Photomask sticks to SU8

[Howard Northfield]

Bake it longer:
(rt to 65°C at 200°C/min)+(10min at 65°C)+(65°C to 95°C at 200°C/min)+(30min at 95°C)+(95°C to rt)

Clean the mask as you would develop; in a bath of SU-8 developer and spray rinse, followed by IPA bath and rinse.



Howard Northfield
Research Associate
Advanced Research Complex (ARC)
University of Ottawa
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Chang, Long <lvchang at Central.UH.EDU>
Sent: Friday, June 7, 2024 5:50 PM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Photomask sticks to SU8

Attention : courriel externe | external email
Hello,

I just used Quartz Cr photomask for the first time with SU8 3050 and the SU8 stuck to the photomask after exposure, see photo. How can I prevent SU8 from sticking to my mask? How should I clean the mask?

Thanks,
Long Chang
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>
[cid:F0FA288B-200E-402B-846E-5EA05666DAFE]



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