[labnetwork] Photomask sticks to SU8

[Zhichao Wang]

Hi Long,

We use 10min at 65C and 30min at 95C for thick SU-8 pre-bake. One of our users
leaves the pre-baked wafer on a flat surface overnight and runs the
exposure the next day, it seems like the film height uniformity can be
slightly improved.

Best,

On Sat, Jun 8, 2024 at 10:46 AM Howard Northfield <
Howard.Northfield at uottawa.ca> wrote:

>
> Bake it longer:
> (rt to 65°C at 200°C/min)+(10min at 65°C)+(65°C to 95°C at 200°C/min)+(30min at 95°C)+(95°C
> to rt)
>
> Clean the mask as you would develop; in a bath of SU-8 developer and spray
> rinse, followed by IPA bath and rinse.
>
>
>
> Howard Northfield
> Research Associate
> Advanced Research Complex (ARC)
> University of Ottawa
> ------------------------------
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Chang,
> Long <lvchang at Central.UH.EDU>
> *Sent:* Friday, June 7, 2024 5:50 PM
> *To:* Fab Network <labnetwork at mtl.mit.edu>
> *Subject:* [labnetwork] Photomask sticks to SU8
>
> *Attention : courriel externe | external email*
> Hello,
>
> I just used Quartz Cr photomask for the first time with SU8 3050 and the
> SU8 stuck to the photomask after exposure, see photo. How can I prevent SU8
> from sticking to my mask? How should I clean the mask?
>
> Thanks,
> Long Chang
> UH Nanofabrication Facility
> Houston, TX
> lvchang at central.uh.edu
>
>
>
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> labnetwork mailing list
> labnetwork at mtl.mit.edu
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>


-- 

*Zhichao "Chao" Wang, Ph.D.*
*Lithography Engineer*
*UDNF*
*University of Delaware*
*Pronouns: He/Him/His*
*------------------------*
*Office Number：(302) 831-4839*
*221 Academy St.，RM170*
*Newark, DE 19711*
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