[labnetwork] Photomask sticks to SU8

[Zhichao Wang]

UCSB has a page of Manual Edge-Bead Removal Techniques

https://wiki.nanofab.ucsb.edu/wiki/Photolithography_-_Manual_Edge-Bead_Removal_Techniques

On Mon, Jun 10, 2024 at 9:52 AM Chang, Long <lvchang at central.uh.edu> wrote:

> Thanks everyone. I got the mask mostly clean with SU8 developer. Can’t
> wait to try again with more baking. Anyone has tips for easy and repeatable
> edge bead removal? I’m thinking about using a Q-tip dipped in acetone while
> the wafer is spinning at 500 rpm.
>
> Long Chang
> UH Nanofabrication Facility
> Houston, TX
> lvchang at central.uh.edu
>
>
>
>
> On Jun 10, 2024, at 8:25 AM, Zhichao Wang <zhichaow at udel.edu> wrote:
>
> Hi Long,
>
> We use 10min at 65C and 30min at 95C for thick SU-8 pre-bake. One of our users
> leaves the pre-baked wafer on a flat surface overnight and runs the
> exposure the next day, it seems like the film height uniformity can be
> slightly improved.
>
> Best,
>
> On Sat, Jun 8, 2024 at 10:46 AM Howard Northfield <
> Howard.Northfield at uottawa.ca> wrote:
>
>>
>> Bake it longer:
>> (rt to 65°C at 200°C/min)+(10min at 65°C)+(65°C to 95°C at 200°C/min)+(30min at 95°C)+(95°C
>> to rt)
>>
>> Clean the mask as you would develop; in a bath of SU-8 developer and
>> spray rinse, followed by IPA bath and rinse.
>>
>>
>>
>> Howard Northfield
>> Research Associate
>> Advanced Research Complex (ARC)
>> University of Ottawa
>> ------------------------------
>> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Chang,
>> Long <lvchang at Central.UH.EDU>
>> *Sent:* Friday, June 7, 2024 5:50 PM
>> *To:* Fab Network <labnetwork at mtl.mit.edu>
>> *Subject:* [labnetwork] Photomask sticks to SU8
>>
>> *Attention : courriel externe | external email*
>> Hello,
>>
>> I just used Quartz Cr photomask for the first time with SU8 3050 and the
>> SU8 stuck to the photomask after exposure, see photo. How can I prevent SU8
>> from sticking to my mask? How should I clean the mask?
>>
>> Thanks,
>> Long Chang
>> UH Nanofabrication Facility
>> Houston, TX
>> lvchang at central.uh.edu
>> <Screen Shot 2024-06-07 at 4.48.32 PM.png>
>>
>>
>>
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>> <https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!LkSTlj0I!D0ZXGmsjLdP-1BtJkBRxOiAL0scuehEXAXXLqNzgnKtfepa3Q3fhKti1rRKbyOp4h3n2pWhZEN4qA2BiLKnALPA$>
>>
>
>
> --
>
> *Zhichao "Chao" Wang, Ph.D.*
> *Lithography Engineer*
> *UDNF*
> *University of Delaware*
> *Pronouns: He/Him/His*
> *------------------------*
> *Office Number：(302) 831-4839*
> *221 Academy St.，RM170*
> *Newark, DE 19711*
>
>
>

-- 

*Zhichao "Chao" Wang, Ph.D.*
*Lithography Engineer*
*UDNF*
*University of Delaware*
*Pronouns: He/Him/His*
*------------------------*
*Office Number：(302) 831-4839*
*221 Academy St.，RM170*
*Newark, DE 19711*
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20240610/e0a0fe3b/attachment.html>