[labnetwork] Photomask sticks to SU8

[Chang, Long]

Thanks everyone. I got the mask mostly clean with SU8 developer. Can’t wait to try again with more baking. Anyone has tips for easy and repeatable edge bead removal? I’m thinking about using a Q-tip dipped in acetone while the wafer is spinning at 500 rpm.

Long Chang
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>




On Jun 10, 2024, at 8:25 AM, Zhichao Wang <zhichaow at udel.edu<mailto:zhichaow at udel.edu>> wrote:

Hi Long,

We use 10min at 65C and 30min at 95C for thick SU-8 pre-bake. One of our users leaves the pre-baked wafer on a flat surface overnight and runs the exposure the next day, it seems like the film height uniformity can be slightly improved.

Best,

On Sat, Jun 8, 2024 at 10:46 AM Howard Northfield <Howard.Northfield at uottawa.ca<mailto:Howard.Northfield at uottawa.ca>> wrote:

Bake it longer:
(rt to 65°C at 200°C/min)+(10min at 65°C)+(65°C to 95°C at 200°C/min)+(30min at 95°C)+(95°C to rt)

Clean the mask as you would develop; in a bath of SU-8 developer and spray rinse, followed by IPA bath and rinse.



Howard Northfield
Research Associate
Advanced Research Complex (ARC)
University of Ottawa
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Chang, Long <lvchang at Central.UH.EDU<mailto:lvchang at Central.UH.EDU>>
Sent: Friday, June 7, 2024 5:50 PM
To: Fab Network <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] Photomask sticks to SU8

Attention : courriel externe | external email
Hello,

I just used Quartz Cr photomask for the first time with SU8 3050 and the SU8 stuck to the photomask after exposure, see photo. How can I prevent SU8 from sticking to my mask? How should I clean the mask?

Thanks,
Long Chang
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>
<Screen Shot 2024-06-07 at 4.48.32 PM.png>



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Zhichao "Chao" Wang, Ph.D.
Lithography Engineer
UDNF
University of Delaware
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