[labnetwork] Sentech GmbH ICP-RIE etch and ICP-CVD tools

[LaFleur, David W]

Hi Golan,

We have a Si 500 etch tool here at Harvard, Center for Nanoscale Systems. We installed it in April 2024. The user purchased it for our center and it is only to be used for diamond etching. After 1 year it will be opened to all users and we may open it up to other processes. They hardly use it and so I cannot tell you how it performs or it’s reliability. So far so good. It seems to be a well made and designed system. I wish we would start running it so I would know the answer to these questions myself.

Regards,

David LaFleur
Equipment Engineer
CNS, Harvard University
11 Oxford St.
Cambridge, Ma. 02138
6174857366
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From: "labnetwork-bounces at mtl.mit.edu" <labnetwork-bounces at mtl.mit.edu> on behalf of Golan Tanami <golant at savion.huji.ac.il>
Date: Monday, November 18, 2024 at 7:54 AM
To: "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Sentech GmbH ICP-RIE etch and ICP-CVD tools

Dear Labnetwork,

I was wondering if any of you has an experience with these tools (SI500 and SI500 D).
More specifically, please relate to their long-term reliability and their remote-support service in case needed.

Best regards,

Golan.



[cid:image001.jpg at 01DB39A5.8D75DB60]
Golan A. Tanami, PhD | Head of the Unit for Nanofabrication (UNF)

Center for Nanoscience and Nanotechnology
Edmond J. Safra Campus
The Hebrew University of Jerusalem
T +972.2.6584179 | M +972.50.9891111
golant at savion.huji.ac.il<mailto:golant at savion.huji.ac.il>
Website: https://nano.huji.ac.il/UNF<https://urldefense.proofpoint.com/v2/url?u=https-3A__nano.huji.ac.il_UNF&d=DwMGaQ&c=WO-RGvefibhHBZq3fL85hQ&r=6eLRBFWstHA_77uCRuGQiAtV9vZWeQjYS4oSMBfEHZE&m=Vhbb1dtxEqu_9iXNGpkU13hFTtzelQvpC9XeeaCGr1wAD1-vP22KJRmS4svnoyV9&s=x8EF6bc-cwTwrRVg2oM9t0dHSwC4cv25fzniNp0ih30&e=>


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