[labnetwork] Sentech GmbH ICP-RIE etch and ICP-CVD tools

[Wolfgang Harneit]

We have a SI500 etcher since late 2020 and use mostly fluorine chemistry 
for diamond and silicon etching, although the machine is specified to be 
Cl-compatible. The machine seems quite robust and delivers very 
consistent performance over time. We had very little trouble, even when 
moving the machine from a preliminary lab installation (done by Sentech) 
to the final operational place, where only the input chamber reaches 
through the clean-room wall. Almost all problems we had turned out to be 
due to our limited previous experience (i.e. user errors). The company 
always supported us promptly and efficiently, we have zero complaints 
there. This included "live" and offline remote technical assistance as 
well as recipe support.

HTH, Wolfgang Harneit

On 18.11.24 08:38, Golan Tanami wrote:
>
> Dear Labnetwork,
>
> I was wondering if any of you has an experience with these tools 
> (SI500 and SI500 D).
>
> More specifically, please relate to their long-term reliability and 
> their remote-support service in case needed.
>
> Best regards,
>
> Golan.
>
> 	
>
> *Golan A. Tanami, PhD**| *Head of the Unit for Nanofabrication (UNF)
>
> **
>
> *Center for Nanoscience and Nanotechnology*
>
> Edmond J. Safra Campus
> The Hebrew University of Jerusalem
> T +972.2.6584179 | M +972.50.9891111
> golant at savion.huji.ac.il <mailto:golant at savion.huji.ac.il>
>
> Website: https://nano.huji.ac.il/UNF <https://nano.huji.ac.il/UNF>
>
>
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-- 
Prof. Dr. Wolfgang Harneit
Universität Osnabrück, Fachbereich Mathematik/Informatik/Physik
Institut für Physik, Barbarastr. 7, 49076 Osnabrück, Germany
www.quantum-spintronics.de,www.molecular-spintronics.de
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