[labnetwork] Small footprint PECVD for silicon nitride
Christophe Clément
christophe.clement at polymtl.ca
Fri Oct 4 17:25:10 EDT 2024
Corial tool from Plasma Therm.
Christophe
Christophe Clément
Professionnel de recherche
Laboratoire de microfabrication (LMF)
Groupe des Couches Minces (GCM) www.gcmlab.ca<http://www.gcmlab.ca/>
Ecole Polytechnique de Montréal www.polymtl.ca<http://www.polymtl.ca/>
Département de génie physique
* 2900 Boulevard Edouard Monpetit
Pavillon JAB
Campus de l'Université de Montréal
Montréal (Québec) H3T 1J4
* christophe.clement at polymtl.ca<mailto:christophe.clement at polymtl.ca>
* 514 340 4711 #2417
Fax : 514 340 5195
________________________________
De : Joseph Losby <joseph.losby at ucalgary.ca>
Envoyé : 3 octobre 2024 21:59
À : labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Objet : [labnetwork] Small footprint PECVD for silicon nitride
Hi everyone,
We are looking for a smaller footprint PECVD tool strictly for the deposition of high quality SiN films. Would you have any recommendations or other advice? Some options are the Oxford PlasmaPro 80 and Trion Orion systems.
Cheers,
Joe
Joseph Losby, PhD
Manager, qLab Operations
joseph.losby at ucalgary.ca
[cid:da3c294b-25cf-4201-a7e8-5a7dd00ddd79]<https://io.ucalgary.ca/quantum-city>
Join us October 2-3, 2024 at the Telus Convention Centre<https://web-eur.cvent.com/event/57a389bc-f435-4ee8-86b5-0cc1c880b687/regProcessStep1> for qConnect 2024
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