[labnetwork] Small footprint PECVD for silicon nitride

Christophe Clément christophe.clement at polymtl.ca
Fri Oct 4 17:25:10 EDT 2024


Corial tool from Plasma Therm.

Christophe


Christophe Clément

Professionnel de recherche

Laboratoire de microfabrication (LMF)

Groupe des Couches Minces (GCM) www.gcmlab.ca<http://www.gcmlab.ca/>

Ecole Polytechnique de Montréal www.polymtl.ca<http://www.polymtl.ca/>

Département de génie physique

* 2900 Boulevard Edouard Monpetit

Pavillon JAB
Campus de l'Université de Montréal
Montréal (Québec) H3T 1J4

* christophe.clement at polymtl.ca<mailto:christophe.clement at polymtl.ca>

* 514 340 4711 #2417

Fax : 514 340 5195

________________________________
De : Joseph Losby <joseph.losby at ucalgary.ca>
Envoyé : 3 octobre 2024 21:59
À : labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Objet : [labnetwork] Small footprint PECVD for silicon nitride

Hi everyone,

We are looking for a smaller footprint PECVD tool strictly for the deposition of high quality SiN films.  Would you have any recommendations or other advice?  Some options are the Oxford PlasmaPro 80 and Trion Orion systems.

Cheers,
Joe



Joseph Losby, PhD

Manager, qLab Operations

joseph.losby at ucalgary.ca


[cid:da3c294b-25cf-4201-a7e8-5a7dd00ddd79]<https://io.ucalgary.ca/quantum-city>

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