[labnetwork] Photoresist and Ebeam Resist In Same Spinner?

[Iulian Codreanu]

Hi Grant,

Here at UDel, we have two sets of spinners/hotplates for e-beam resists, 
two sets for photo-resists, and one set for gooey materials, such as SU-8.

As you know, e-beam resists typically require higher baking temperatures 
so the hotplates for the e-beam units are set at higher temperatures. We 
train the users to use the appropriate spinner/hotplate for their type 
of resist so they do not have to adjust the hot plate temperatures (cool 
downs are very slow). However, if something goes wrong with the 
photo-resist units, we allow photo-resists in the e-beam units; e-beam 
resists are allowed in the photo-resists units if the e-beam units are down.

We are very strict with the gooey materials; they can only be used in 
their designated unit and stuff that is processed in the e-beam or photo 
units is not allowed in the gooey unit. This is mostly dictated by 
cleaning considerations.

Cheers,

Iulian

iulian Codreanu, Ph.D.
Director, Nanofabrication Facility
University of Delaware
Harker ISE Lab, Room 163
221 Academy Street
Newark, DE 19716
302-831-2784
https://udnf.udel.edu

On 2/18/2025 9:27 PM, Grant Shao wrote:
> Hello Labnetwork,
>
> I'm wondering if there's a chemical reason for having dedicated 
> spinners to keep photoresist and ebeam resist separated. I think quite 
> a few of the university nanofabs do this, but wondering what the 
> rationale is. Is there some sort of chemical reaction that makes it 
> more likely to contaminate or harder to clean up?
>
> Thanks,
> Grant
>
> --
> Grant Shao
> Nanofabrication Operations Manager
> _Stanford Nano Shared Facilities <http://snsf.stanford.edu/>_
>
> _shaog at stanford.edu <mailto:shaog at stanford.edu>_ | 650.441.9042
> Spilker Building, Room 004
> 348 Via Pueblo
> Stanford, CA 94305-4088
>
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