[labnetwork] Photoresist and Ebeam Resist In Same Spinner?

[bordonaro at cnf.cornell.edu]

Grant,

 

The primary reason we do it is that they use different solvents.  Unless all
solvent has evaporated before spinning a different material it can affect
the resulting film.  There are also some incompatible solids; for example,
PMMA doesn't dissolve in PGMEA, so bowl drains can become clogged.  The
worst cases are things like LOR or SU-8, which seem to react in the resist
bowl and drain, causing clogs that can be extremely difficult to remove.

 

 

Garry J. Bordonaro

Microlithographic Engineer

Cornell NanoScale Facility

250 Duffield Hall

343 Campus Road

Ithaca NY 14853-2700

(607) 254-4936

bordonaro at cnf.cornell.edu <mailto:bordonaro at cnf.cornell.edu> 

http://www.cnf.cornell.edu/
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Please acknowledge CNF in your publications:

"This work was performed in part at the Cornell NanoScale Science &
Technology Facility (CNF), a member of the National Nanotechnology
Coordinated Infrastructure (NNCI), which is supported by the National
Science Foundation (Grant NNCI-2025233)."

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Grant Shao
Sent: Tuesday, February 18, 2025 9:27 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?

 

Hello Labnetwork,

 

I'm wondering if there's a chemical reason for having dedicated spinners to
keep photoresist and ebeam resist separated. I think quite a few of the
university nanofabs do this, but wondering what the rationale is. Is there
some sort of chemical reaction that makes it more likely to contaminate or
harder to clean up?

 

Thanks,

Grant

 

--

Grant Shao

Nanofabrication Operations Manager

 <http://snsf.stanford.edu/> Stanford Nano Shared Facilities

 

 <mailto:shaog at stanford.edu> shaog at stanford.edu | 650.441.9042

Spilker Building, Room 004

348 Via Pueblo

Stanford, CA 94305-4088

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