[labnetwork] Photoresist and Ebeam Resist In Same Spinner?

[Yakimov, Michael]

I would expect something along the lines of stuff precipitation in the drain. Common novolak resists use pgema or lactate solvent, usually supplemented with acetone and ipa are cross compatible, and may dry but not precipitate.
SU8 is developed - aka soluble - in pgema, but not soluble in acetone as far as I remember.
With ebeam resists and-or spin-on glass chemistry is very different and more diverse. Small quantities and wiping the bowl may help with drainage maybe?

Thanks

Mike



Get Outlook for Android<https://aka.ms/AAb9ysg>
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Virgínia Soares <vsoares at inesc-mn.pt>
Sent: Wednesday, February 19, 2025 8:24:55 AM
To: 'Grant Shao' <shaog at stanford.edu>; labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?


Dear Grant,



I our lab we use the same spinner for photo and e beam resist, though I am not sure it should be done as we were buying a new resist track and the supplier told us we should not mix negative resists (like most of our e-beam resists) with positive resists. Something about it being hard to clean as you cannot use the same solvents and that it would end up clogging the lines. That wasn’t for a manual spinner mind you.



Melhores Cumprimentos/Best Regards





Virginia Soares

[cid:image001.png at 01DB82D1.0B2017F0]



INESC-MN

Rua Alves Redol,9

1000-029 Lisboa

Portugal

www.inesc-mn.pt





From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Grant Shao
Sent: 19 de fevereiro de 2025 02:27
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?



Hello Labnetwork,



I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this, but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?



Thanks,

Grant



--

Grant Shao

Nanofabrication Operations Manager

Stanford Nano Shared Facilities<http://snsf.stanford.edu/>



shaog at stanford.edu<mailto:shaog at stanford.edu> | 650.441.9042

Spilker Building, Room 004

348 Via Pueblo

Stanford, CA 94305-4088
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20250219/8b0dbd72/attachment.html>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: image001.png
Type: image/png
Size: 9655 bytes
Desc: image001.png
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20250219/8b0dbd72/attachment.png>