[labnetwork] Photoresist and Ebeam Resist In Same Spinner?

[Virgínia Soares]

Dear Grant,

 

I our lab we use the same spinner for photo and e beam resist, though I am
not sure it should be done as we were buying a new resist track and the
supplier told us we should not mix negative resists (like most of our e-beam
resists) with positive resists. Something about it being hard to clean as
you cannot use the same solvents and that it would end up clogging the
lines. That wasn’t for a manual spinner mind you.

 

Melhores Cumprimentos/Best Regards

 

 

Virginia Soares



 

INESC-MN

Rua Alves Redol,9

1000-029 Lisboa

Portugal

www.inesc-mn.pt

 

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Grant Shao
Sent: 19 de fevereiro de 2025 02:27
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?

 

Hello Labnetwork,

 

I'm wondering if there's a chemical reason for having dedicated spinners to
keep photoresist and ebeam resist separated. I think quite a few of the
university nanofabs do this, but wondering what the rationale is. Is there
some sort of chemical reaction that makes it more likely to contaminate or
harder to clean up?

 

Thanks,

Grant

 

--

Grant Shao

Nanofabrication Operations Manager

 <http://snsf.stanford.edu/> Stanford Nano Shared Facilities

 

 <mailto:shaog at stanford.edu> shaog at stanford.edu | 650.441.9042

Spilker Building, Room 004

348 Via Pueblo

Stanford, CA 94305-4088

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