[labnetwork] low temperature ALD deposition

[Liu, Bangzhi]

Hi Esta,
I’m not sure what chemistry you use on the Fiji200. Typically, a thermal HfO₂ process with TDMAH and H₂O requires temperatures above 100°C. I’m guessing you’re running PEALD at 80°C instead.
In our experience, we haven’t encountered this issue in either our thermal or PEALD chambers. Problems usually arise when the tool becomes heavily coated, and the coatings begin to peel off. In such cases, a thorough tool cleaning generally resolves the issue.
Best,
Bangzhi Liu
Associate Research Professor
Penn State

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