[labnetwork] Silicon based high temperature thermal grease
Yakimov, Michael
myakimov at albany.edu
Sat Jan 4 11:09:33 EST 2025
I believe the way it usually works is that you need heat conducting media at lower temperatures because radiation transfer isn't efficient.
If you're talking 350 C, your radiation emission is roughly speaking (T1/T2)^4~ 15 times more efficient than at room temperature. Hence usually no heat transfer media up there. Can be dopant dependent for Si, though.
If you really want to have some medium at high temperature, Indium and/or In-Ga eutectics work great - although they have their own set of problems.
Thanks
Mike
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________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Gohmyeong Bae <gohmyeongbae at umass.edu>
Sent: Friday, January 3, 2025 9:58:00 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Silicon based high temperature thermal grease
Dear Lab network,
We are looking for the high temperature silicon based thermal grease for the ICP/DEEP RIE etching system that can dissipate the heat on the back side of silicon wafer.
It should be covered in around Max. 660-degree Fahrenheit, which can properly applied into the ICP-RIE system either Oxford or other brand.
If you have any product information regarding this, please share to us.
Thank you.
Best,
Gohmyeong Bae.
Gohmyeong Bae, M. S.
He/Him/His
Institute of Applied Life Science (IALS)
Cleanroom Facility Manager for Nano and Device Fabrication Cleanroom
Conte building B111, Marcus Hall 25
Amherst, MA 01003
413-472-1570
gohmyeongbae at umass.edu
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